Particle lithography offers generic capabilities for the high-throughput fabrication of nanopatterns from organosilane self-assembled\r\nmonolayers, which offers the opportunity to study surface-based chemical reactions at the molecular level. Nanopatterns of\r\noctadecyltrichlorosilane (OTS) were prepared on surfaces of Si(111) using designed protocols of particle lithography combined\r\nwith either vapor deposition, immersion, or contact printing. Changing the physical approaches for applying molecules to masked\r\nsurfaces produced OTS nanostructures with different shapes and heights. Ring nanostructures, nanodots and uncovered pores of\r\nOTS were prepared using three protocols, with OTS surface coverage ranging from 10% to 85%. Thickness measurements from\r\nAFM cursor profiles were used to evaluate the orientation and density of the OTS nanostructures. Differences in the thickness and\r\nmorphology of the OTS nanostructures are disclosed based on atomic force microscopy (AFM) images. Images of OTS nanostructures\r\nprepared on Si(111) that were generated by the different approaches provide insight into the self-assembly mechanism of\r\nOTS, and particularly into the role of water and solvents in hydrolysis and silanation.
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