In order to effectively and quickly clean the surface of semiconductor silicon wafers,\nthe fluid flow is one of the significant issues. For a batch-type silicon wafer wet\ncleaning bath, a slim water injection nozzle consisting of a dual tube was studied,\nbased on theoretical calculations and experiments. A thin inner tube was placed at\nthe optimum position in the water injection nozzle. Such a simple design could make\nthe water injection direction normal and the water velocity profile symmetrical along\nthe nozzle. The water flow in the wet cleaning bath was observed using a bluecolored\nink tracer. When the nozzle developed in this study was placed at the bottom\nof the bath, a fast and symmetrical upward water stream was formed between and\naround the wafers.
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