By using a homojunction-structured GaP single crystal, we generated a photon energy higher than the bandgap energy (2.26 eV).\nThe device was fabricated by performing dressed-photon-phonon- (DPP-) assisted annealing, while applying a forward-bias\ncurrent, on a p-n homojunction structure formed by implanting a dopant (Zn) into an n-type GaP substrate. The DPP-assisted\nannealing increased the light emission intensity in an energy band above 2.32 eV by at least 550% compared with that before\nannealing.
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